 |
| |
| |
 |
이원재교수
|
|
ㆍ 동의대학교 나노공학과 부교수 |
|
ㆍ 전공 : 전자세라믹스박막/나노박막 |
| ㆍ
주소 : 부산광역시 부산진구 엄광로 995번지 |
| ㆍ
Tel : 051) 890 - 1720 ,2524 |
| ㆍ
Fax : 051) 890 - 1714 |
|
ㆍ E-mail
: leewj@deu.ac.kr |
|
|
| |
|
Education |
|
|
|
|
|
| B.S. |
1986.3
~ 1990.2 |
한국과학기술원(KAIST) |
Materials
Sci Eng. |
KOREA |
| M.S. |
1990.3
~ 1991.2 |
한국과학기술원(KAIST) |
Inorganic |
KOREA |
| Ph.D. |
1991.3.
~ 1995.8 |
한국과학기술원(KAIST)
|
Materials
Sci Eng. |
KOREA |
|
|
|
|
|
|
Experience |
주요경력 |
|
|
|
|
|
| 1995.9.
~ 1997.10. |
한국과학기술원(KAIST),
전자세라믹재료연구센터(ECMRC)/전자부품 재료설계 인력교육센터(EMDEC) |
Post-Doc. |
| 1996.3.
~ 1997.4. |
(USA) North Carolina State Universty
Materials Sci Eng. |
Post-Doc. |
| 1997.11.
~ 2002.2. |
한국전자통신
연구원(ETRI)
반도체원천기술연구소 강유전체소자팀 |
선임연구원
|
| 2002.3.
~ 현재 |
Dongeui
Uni.(Dept. of Nano Technology) |
교수 |
|
|
|
| |
|
박사학위 논문 |
|
RF Magnetron
Sputtering법으로 제조한 BSTO 박막의 물성
및 특성평가
(Key Words: high-dielectric constant,
BST films, sputtering, leakage
current, thin films analysis)
|
|
|
|
| |
|
RESEARCH EXPERIENCE |
|
| Mar. 2002. - Present |
| Professor,
Advanced Materials Engineering,
Dongeui University, Korea |
|
|
|
| -
High dielectric layers by PEALD(plasma
enhanced atomic layer deposition)
process. |
| -
Electrical properties and mechanism
analysis of ferroelectric thin
films. |
| -
Nanotechnology. |
| -
SiC, AlN Single Crystal growth
by Vapor phase. |
|
|
|
| |
|
| Nov. 1997.- Feb. 2002. |
Senior
Researcher, ETRI-Micro-Electronics
Technology Lab.
Electronics and Telecommunications
Research Institute (ETRI), Korea |
|
|
|
| -
The integration of 1-Tr Ferroelectric
Random Access Memory (FRAM) device. |
| -
High dielectric layers by ALD(atomic
layer deposition) process. |
| -
SBT films deposited by Cyclic
MOCVD and MOD process for NDRO
type FRAM. |
| -
Etchings for ferroelectrics and
metal electrodes (Pt, Al etc)
by MERIE process. |
| -
Semiconductor processes for device
integration. |
| -
IR detector array fabrication
with using pyroelectric thin films. |
| -
Electrophoretic display for D-paper
Application |
|
|
|
| |
|
| Mar. 1996. - Apr. 1997 |
Post-doctor,
Dept. of Materials Science and
Engineering
North Carolina State University,
USA |
|
|
|
| -
Fabrications of Liquid Delivery
Source MOCVD systems |
-
Process development of Liquid
Delivery Source MOCVD-BST films
for G-bit DRAM
capacitors. |
| -
Electrical properties of BST films
with various top electrodes (Pt,
Ir, Ru). |
| -
Studied " Ferroelectrics
in MSE, Semiconductor process
in EE" |
|
|
|
| |
|
| Sep. 1995. - Oct. 1997. |
Post-doctor,
Electronic Ceramic Materials Research
Center, KAIST, Korea
Senior Researcher, Electronic
Ceramic Materials Research Center
(ECMRC) &
Electronic Component, Materials
Design Education Center(EMDEC),
KAIST, Korea |
|
|
|
| -
Process development of capacitor
materials for high-density DRAM. |
| -
SBT films deposited by ECR-MOCVD
process for Non-volatile FRAM. |
| -
High-density DRAM capacitor(ETRI) |
| -
Development of storage capacitor
for high-dielectric materials(Hyundai
Electronics) |
| -
Process development of thin films
actuators(Daewoo Electronics) |
|
|
|
| |
|
| Mar. 1991. - Aug. 1995. |
Graduate
Research Assistant,
Dept. of Materials Science and
Engineering, KAIST, Korea |
|
|
|
| -
High-density DRAM capacitor(ETRI) |
| -
Development of storage capacitor
for high-dielectric materials(Hyundai
Electronics) |
| -
Process development of thin films
actuators(Daewoo Electronics)
|
| -
Ion beam sputtering system/XPS
analysis in KRISS( Sep. '92 -
Feb. '93 ) |
| -
ITO thin films deposited by DC
magnetron sputtering(Samsung Corning) |
| -
Powder preparation of Bi-based
superconductor by emulsion drying
methods. |
| -
Studied surface analysis and deposition
techniques for thin films. |
|
|
|
| |
|
| Mar. 1990. - Feb. 1991. |
| Graduate
Student, Dept. of Materials Science
and Engineering, KAIST, Korea |
|
|
|
-
Powder process of Bi2O3-doped
YSZ materials for oxide electrolyte
application
(Fuel cell). |
| -
Studied powder processes and electronic
ceramic materials including oxide
sensor. |
|
|
|
| |
 |
| |
